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Si/Si1−xGex heterostructure field effect transistors fabricated using a low thermal budget CMOS process

✍ Scribed by R.B. Dunford; D.J. Paul; M. Pepper; B. Coonan; N. Griffin; G. Redmond; G.M. Crean; B. Holländer; S. Mantl


Book ID
108411105
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
863 KB
Volume
53
Category
Article
ISSN
0167-9317

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