𝔖 Bobbio Scriptorium
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SiO2 layer implanted with N2+ ions as a negative inorganic resist for ion beam lithography

✍ Scribed by Zbigniew Znamirowski; Janusz Martan


Book ID
113277205
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
357 KB
Volume
7-8
Category
Article
ISSN
0168-583X

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