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Simultaneous formation of titanium nitride and titanium silicide in a one-step process in heterogeneous phase during multipulse laser treatment of a Si wafer with a thin Ti coating in superatmospheric N2

✍ Scribed by I.N. Mihailescu; N. Chitica; Adriana Lita; V.S. Teodorescu; A. Luches; G. Leggieri; M. Martino; G. Majni; P. Mengucci


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
631 KB
Volume
251
Category
Article
ISSN
0040-6090

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