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Simulation study of the NA?'s dependence of DOF for 193-nm immersion lithography at 65-nm node

โœ Scribed by Guosheng Huang; Yanqiu Li


Book ID
115367139
Publisher
Optics InfoBase
Year
2005
Tongue
English
Weight
353 KB
Volume
3
Category
Article
ISSN
1671-7694

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We present a kinetic study of the reaction between atomic sodium and nitrous oxide in the temperature range 349-917K. Na(32S~/2) was generated by the pulsed irradiation of NaI vapor in the presence of N20 and excess helium buffer gas, and monitored photoelectrically in the "single-shot" mode by time