✦ LIBER ✦
Simulation of resist profiles in single and triple layer electron beam lithography : P. R. Deshmukh, N. K. L. Raja and W. S. Khokle. Microelectron. J.18 (6), 32 (1987)
- Publisher
- Elsevier Science
- Year
- 1988
- Tongue
- English
- Weight
- 238 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0026-2714
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