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Simulation of particle–vortex interactions in the modified chemical vapor deposition process

✍ Scribed by Catherine K.W. Cheung; Daniel Haley; David F. Fletcher; Geoff W. Barton; Pam McNamara

Book ID: 116670601
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 909 KB
Volume: 353
Category: Article
ISSN: 0022-3093
DOI: 10.1016/j.jnoncrysol.2007.06.025

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