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Simulation of lateral Al recoil atoms and damage defects gradients in a GaAs/GaAlAs quantum well created by masked ion implantation

✍ Scribed by M.M. Faye; C. Vieu; L. Laânab; J. Beauvillain; A. Claverie


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
322 KB
Volume
21
Category
Article
ISSN
0921-5107

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