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Simulation approach for achieving layout independent polysilicon gate etching

✍ Scribed by Harafuji, K.; Ohkuni, M.; Kubota, M.; Nakagawa, H.; Misaka, A.


Book ID
114537734
Publisher
IEEE
Year
1999
Tongue
English
Weight
452 KB
Volume
46
Category
Article
ISSN
0018-9383

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