Simplified flat embedding with lowicryl K4M and LR White

✍ Scribed by Erdos, Gregory W.

• Book ID: 102332922
• Publisher: Wiley (John Wiley & Sons)
• Year: 1987
• Tongue: English
• Weight: 140 KB
• Volume: 5
• Category: Article
• ISSN: 0741-0581
• DOI: 10.1002/jemt.1060050114

✦ Synopsis

R e c e n t developments in post embedding immunolabellinq for electron microscopy have relied on t h e use of t w o acrylic embedding resins, Lowicryl K4M (Altman, 5 d., 1984 and Roth, g r e a t l y increased t h e sensistivity and efficiency of t h e technique. drawbacks of t h e s e resins is t h a t they require t h e exclusion of oxygen in order for polymerization to occur. Described h e r e is a simple technique which allows such f l a t embedding without t h e construction of anaerobic chambers.