✦ LIBER ✦
Simple Model for Ion-Assisted Etching Using<tex>$hboxCl_2hbox--hboxAr$</tex>Inductively Coupled Plasma: Effect of Gas Mixing Ratio
✍ Scribed by Efremov, A.M.; Kim, D.-P.; Kim, C.-I.
- Book ID
- 120294591
- Publisher
- IEEE
- Year
- 2004
- Tongue
- English
- Weight
- 256 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0093-3813
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