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Simple activated transport in ion-implanted Si:As at temperatures below 0.5 K

✍ Scribed by R.W. van der Heijden; G. Chen; A.T.A.M. de Waele; H.M. Gijsman; F.P.B. Tielen


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
365 KB
Volume
78
Category
Article
ISSN
0038-1098

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