✦ LIBER ✦
Silicon deposition from SiCl4 in a cold r.f. plasma: The effect of doping gases on deposition rates, chlorine content and the morphology of the films
✍ Scribed by R. Manory; E. Grossman; R. Avni; A. Grill
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 591 KB
- Volume
- 121
- Category
- Article
- ISSN
- 0040-6090
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