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Silicon Carbide Epitaxy in a Vertical CVD Reactor: Experimental Results and Numerical Process Simulation

✍ Scribed by R. Rupp; Yu.N. Makarov; H. Behner; A. Wiedenhofer


Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
664 KB
Volume
202
Category
Article
ISSN
0370-1972

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