Silicide formation at the Ti/Si(111) interface: Diffusion parameters and behavior at elevated temperatures

✍ Scribed by Chambers, S. A.; Hill, D. M.; Xu, F.; Weaver, J. H.

• Book ID: 118203342
• Publisher: The American Physical Society
• Year: 1987
• Tongue: English
• Weight: 359 KB
• Volume: 35
• Category: Article
• ISSN: 1098-0121
• DOI: 10.1103/physrevb.35.634