✦ LIBER ✦
SiGe virtual substrates growth up to 50% Ge concentration for Si/Ge dual channel epitaxy
✍ Scribed by Y. Bogumilowicz; J.M. Hartmann; N. Cherkashin; A. Claverie; G. Rolland; T. Billon
- Book ID
- 108215245
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 196 KB
- Volume
- 124-125
- Category
- Article
- ISSN
- 0921-5107
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