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Sidewall passivation layer thickness and composition profiles of etched silicon patterns from angle resolved x-ray photoelectron spectroscopy analysis

✍ Scribed by Haass, Moritz; Darnon, Maxime; Joubert, Olivier


Book ID
120025545
Publisher
American Institute of Physics
Year
2012
Tongue
English
Weight
688 KB
Volume
111
Category
Article
ISSN
0021-8979

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