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SiCl4-based reactive ion etching of ZnO and MgxZn1−xO films on r-sapphire substrates

✍ Scribed by J. Zhu; G. Saraf; J. Zhong; H. F. Sheng; B. V. Yakshinskiy; Y. Lu


Book ID
107453769
Publisher
Springer US
Year
2006
Tongue
English
Weight
206 KB
Volume
35
Category
Article
ISSN
0361-5235

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