✦ LIBER ✦
SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products
✍ Scribed by Akio Watanabe; Kazuo Osato; Shinji Ninomiya; Masakazu Mukaida; Tatsuo Tsunoda; Yoji Imai
- Book ID
- 107864852
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 647 KB
- Volume
- 274
- Category
- Article
- ISSN
- 0040-6090
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