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Si3N4 thickness and its oxidation time influence on O/N/O DRAM cell performance

✍ Scribed by Luciano Grifoni; Paolo Massimi; Fabrizio Fama'

Book ID: 117148388
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 325 KB
Volume: 216
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(97)00186-5

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