✦ LIBER ✦
Sheath properties of RF plasmas in a parallel-plate etch reactor; the low-frequency regime (ωi )
✍ Scribed by Vallinga, P M; Hoog, F J de
- Book ID
- 127017158
- Publisher
- Institute of Physics
- Year
- 1989
- Tongue
- English
- Weight
- 926 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0022-3727
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