Shape and growth rate of monoatomic layers during the electrocrystallization of silver on a screw-disclocation free (111) crystal face

✍ Scribed by V. Bostanov; W. Obretenov

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 847 KB
• Volume: 34
• Category: Article
• ISSN: 0013-4686
• DOI: 10.1016/0013-4686(89)87157-9

✦ Synopsis

Monoatomic layers have been deposited by two-dimensional nucleation and growth at over-potentials lower than the critical for nucleation by means of the double pulse potentiostatic technique. Current transients due to monolayer deposition have been analysed and it has been concluded that the growth shape of the monolayers is a triangle enclosed by three identical arcs. Out of each current transient, the growth rate ofthe monoatomic steps enclosing the layer has been determined. A linear dependence of the growth rate of the steps on the overpotential has been established. A value of the constant of the growth rate of k,= 1.3 ems-' V-i has been obtained.