✦ LIBER ✦
Shallow junction formation by dopant outdiffusion from CoSi2 and its application in sub 0.5μm MOS processes
✍ Scribed by M. Niazmand; D. Friedrich; W. Windbracke
- Book ID
- 103598988
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 329 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.