Sequential robust design methodology and X-ray photoelectron spectroscopy to analyze the grafting of hyaluronic acid to glass substrates
✍ Scribed by Stile, Ranee A. ;Barber, Thomas A. ;Castner, David G. ;Healy, Kevin E.
- Publisher
- John Wiley and Sons
- Year
- 2002
- Tongue
- English
- Weight
- 252 KB
- Volume
- 61
- Category
- Article
- ISSN
- 0021-9304
No coin nor oath required. For personal study only.
✦ Synopsis
Abstract
Sequential Robust Design experiments and X‐ray photoelectron spectroscopic (XPS) studies were performed to examine the immobilization of hyaluronic acid (HA) on glass substrates chemisorbed with N‐(2‐aminoethyl)‐3‐aminopropyl‐trimethoxysilane (EDS). Numerous reaction conditions were investigated, including the concentrations of 1‐ethyl‐3‐(3‐dimethylaminopropyl) carbodiimide hydrochloride (EDC), N‐hydroxysulfosuccinimide (Sulfo‐NHS), and HA, and the reaction buffer type, concentration, and pH. The elemental surface compositions of carbon and silicon (C/Si ratio) were used to assess the extent of HA immobilization, leading to the identification of critical HA‐binding reaction conditions and the determination of an optimum surface chemistry. The optimum chemistry consisted of 200 m__M__ EDC, 50 m__M__ Sulfo‐NHS, 10 m__M__ N‐(2‐hydroxyethyl)piperazine‐N′‐(2‐ethanesulfonic acid) (HEPES) buffer at a pH of 7.0, and 3 mg/mL HA. This work emphasizes the advantages of using Robust Design methods over traditional statistical experimental design, particularly when large numbers of variables are examined and costly analytical techniques are employed. © 2002 Wiley Periodicals, Inc. J Biomed Mater Res 61: 391–398, 2002
📜 SIMILAR VOLUMES