Sequential injection analysis (SIA) and response surface methodology: A versatile small volume approach for optimization of photo-Fenton processes

✍ Scribed by Allan C.V. dos Santos; Jorge C. Masini

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 335 KB
• Volume: 93
• Category: Article
• ISSN: 0026-265X
• DOI: 10.1016/j.microc.2009.05.007

✦ Synopsis

Optimization of photo-Fenton degradation of copper phthalocyanine blue was achieved by response surface methodology (RSM) constructed with the aid of a sequential injection analysis (SIA) system coupled to a homemade photo-reactor. Highest degradation percentage was obtained at the following conditions [H 2 O 2 ]/ [phthalocyanine] = 7, [H 2 O 2 ]/[FeSO 4 ] = 10, pH = 2.5, and stopped flow time in the photo reactor = 30 s. The SIA system was designed to prepare a monosegment containing the reagents and sample, to pump it toward the photo-reactor for the specified time and send the products to a flow-through spectrophotometer for monitoring the color reduction of the dye. Changes in parameters such as reagent molar ratios, residence time and pH were made by modifications in the software commanding the SI system, without the need for physical reconfiguration of reagents around the selection valve. The proposed procedure and system fed the statistical program with degradation data for fast construction of response surface plots. After optimization, 97% of the dye was degraded.