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Sensitivity and sensitization mechanism of halomethylated polystyrene to near UV region

โœ Scribed by Yu-Chuan Zhang; Hiroshi Morita; Tsuguo Yamaoka

Book ID
102734621
Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
526 KB
Volume
32
Category
Article
ISSN
0021-8995

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Photosensitization of carbazole derivati
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โœ Yaohong Chen; Tetsuya Yamamura; Katsutoshi Igarashi ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 204 KB

Photosensitizers based on the carbazole structure were designed and developed for cationic polymerization. Along with triarylsulfonium and diaryliodonium salts, the carbazole derivatives showed a high photosensitization effect in the cationic photopolymerization of epoxides. The photophysical proper