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Self-Cleaning Properties of TiO2 Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source

โœ Scribed by Pudwat, S.; Rakkwamsuk, P.; Damrongrattana, S.


Book ID
120388521
Publisher
Trans Tech Publications, Ltd.
Year
2008
Tongue
English
Weight
631 KB
Volume
55-57
Category
Article
ISSN
1662-8958

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