Self-assembled Si and SiGe nanostructures: New growth concepts and structural analysis
✍ Scribed by Bauer, G. ;Schäffler, F.
- Book ID
- 105363913
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 984 KB
- Volume
- 203
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
Self‐organization during strained‐layer heteroepitaxy has been a field of intense research in the last few years. Especially the Si/SiGe heterosystem is considered a model system for strain‐driven Stranski–Krastanow growth. In this review article, we concentrate on ordered Stranski–Krastanow growth of Ge and SiGe islands on prepatterned Si(001) substrates, which provide preferential nucleation sites. Perfectly ordered SiGe dot arrays in two and three dimensions are demonstrated, and the basic mechanisms for preferential nucleation in geometrically well‐defined etch pits are discussed. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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