Self-aligned nickel, cobalt/tantalum nitride stacked-gate pMOSFETs fabricated with a low temperature process after metal electrode deposition

✍ Scribed by Pan, J.; Woo, C.; Ngo, M.-V.; Chih-Yuh Yang; Besser, P.; King, P.; Bernard, J.; Adem, E.; Tracy, B.; Pellerin, J.; Qi Xiang; Ming-Ren Lin

• Book ID: 114617265
• Publisher: IEEE
• Year: 2003
• Tongue: English
• Weight: 591 KB
• Volume: 50
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2003.819434