Selective removal of atoms as a new method for fabrication of nanoscale patterned media

✍ Scribed by B.A. Gurovich; D.I. Dolgy; E.A. Kuleshova; E.Z. Meilikhov; A.G. Domantovsky; K.E. Prikhodko; K.I. Maslakov; B.A. Aronzon; V.V. Rylkov; A.Yu. Yakubovsky

• Book ID: 104305922
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 612 KB
• Volume: 69
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(03)00322-8

✦ Synopsis

The method of 'selective removal of atoms' is proposed for purposeful efficient modification of a solid atomic composition under exposure to an accelerated ion beam of a certain energy. Such modification can dramatically change the physical properties of a thin material layer. This method could be used to create directly the needed spatial modulation of atomic composition and physical properties of a material, i.e. to produce a nanoscale patterned media for various applications (magnetic storage media, GaAs Schottky diodes and field effect transistors, optical structures, nanoscale biochips, and many others).