Selective growth of SiGe structures in the sub 100 nm range using low pressure vapor phase epitaxy

✍ Scribed by G. Schmidt; R. Tuzinski; K. Heime

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 424 KB
• Volume: 154
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(95)00179-4