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Selective etching and photoetching of {100} gallium arsenide in CrO3-HF aqueous solutions: I. Influence of composition on etching behaviour

✍ Scribed by J. Weyher; J. Van De Ven


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
963 KB
Volume
63
Category
Article
ISSN
0022-0248

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