✦ LIBER ✦
Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4
✍ Scribed by Marco AR Alves; Olga Balachova; Edmundo da Silva Braga; Lucila Cescato
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 229 KB
- Volume
- 52
- Category
- Article
- ISSN
- 0042-207X
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