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Selective area epitaxy of GaAs and InGaAs by ultra-high vacuum chemical vapor deposition using triethylgallium, trimethylindium, arsine, and monoethylarsine

โœ Scribed by Sung-Bock Kim; Jeong-Rae Ro; Seong-Ju Park; El-Hang Lee


Book ID
108342211
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
535 KB
Volume
169
Category
Article
ISSN
0022-0248

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