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Secondary effects on solid surfaces stimulated by the cathode plasma flux in vacuum arcs

✍ Scribed by J. Kutzner; Z. Załucki

Book ID
112593082
Publisher
Springer
Year
1995
Tongue
English
Weight
440 KB
Volume
45
Category
Article
ISSN
0011-4626

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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane “S” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness