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Secondary effects of single crystalline silicon deep- trench etching in a chlorine-containing plasma for 3- dimensional capacitor cells

✍ Scribed by I.W. Rangelow; P. Thoren; K. Maβeli; R. Kassing; M. Engelhardt; S. Schwarzl


Book ID
107920317
Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
666 KB
Volume
5
Category
Article
ISSN
0167-9317

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