Seamless long line and space pattern fabrication for nanoimprint mold by using electron beam stepper
✍ Scribed by Makoto Okada; Takafumi Kishiro; Masashi Ataka; Norimichi Anazawa; Shinji Matsui
- Book ID
- 104052958
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 903 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
Nanoimprint lithography (NIL) is a simple process to fabricate nanostructure devices with high throughput and low cost. The mold fabrication process is an important factor to improve NIL technology. Adopting a seamless pattern mold fabrication process is expected to enhance throughput. In this study, we developed a seamless long line and space (L and S) pattern fabrication process by using an electron beam (EB) stepper. As a result, a seamless 200 nm line and 300 nm space pattern (120 mm long and 10 mm wide) was exposed on a 6 in. Si wafer. We also carried out thermal nanoimprinting using the seamless L and S pattern mold fabricated by using the EB stepper. We confirmed that the seamless L and S pattern was clearly imprinted on the resin.