Scanning Auger measurements of activated and sputter cleaned Re-coated scandate cathodes

Sputter cleaning of iron substrates and

Sputter cleaning of iron substrates and contamination of TiN coatings studied by in situ Auger electron spectroscopy measurements in an ultrahigh vacuum physical vapour deposition apparatus

✍ N. Eguchi; V. Grajewski; H.H. Uchida; E. Fromm 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 411 KB

The design of an ultrahigh vacuum magnetron sputtering apparatus with facilities for in sttu Auger electron spectroscopy (AES) measurements and plasma diagnostics is presented. It consists of three chambers. The sample can be moved under ultrahigh vacuum conditions from the sputtering chamber throug