๐”– Bobbio Scriptorium
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Sample preparation for STM imaging of silicon at atmospheric pressure

โœ Scribed by Susan Bumgarner; P.E. Russell


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
948 KB
Volume
42-44
Category
Article
ISSN
0304-3991

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๐Ÿ“œ SIMILAR VOLUMES


Atmospheric-pressure plasma pretreatment
โœ M. Eichler; B. Michel; M. Thomas; M. Gabriel; C.-P. Klages ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 631 KB

Using dielectric barrier discharges at atmospheric pressure, silicon wafers have been treated for lowtemperature direct wafer bonding with annealing temperatures down to 100 ยฐC. The experimental setup and the bond procedure are described and the influences of different experimental parameters, such