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Rule based approach for detection of defects in microlithography patterns

โœ Scribed by D.C. Gharpure; S.K. David

Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
300 KB
Volume
23
Category
Article
ISSN
0167-9317

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An OPS5 expert system has been developed, allowing the recognition of an arbitrary subpattern in a complex planar geometric figure under analysis. For this sake a syntactic representation for images is used by the expert system as a relational data base. The expert system looks for consistent mappin