Roughness improvement of the CoSi2/Si-interface for an application as buried silicide

✍ Scribed by S. Zimmermann; Q.T. Zhao; H. Höhnemann; M. Wiemer; C. Kaufmann; S. Mantl; V. Dudek; T. Gessner

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 707 KB
• Volume: 84
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.05.056