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Roughening mechanisms of tensily strained Si1−x−yGexCy films grown by UHV-CVD: evidence of a carbon surface diffusion related mechanism

✍ Scribed by Cyril Calmes; Daniel Bouchier; Catherine Clerc; Yulin Zheng


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
322 KB
Volume
224
Category
Article
ISSN
0169-4332

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