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Room temperature interfacial reactions in electrodeposited Au/Sn couples

โœ Scribed by Wenming Tang; Anqiang He; Qi Liu; Douglas G. Ivey


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
959 KB
Volume
56
Category
Article
ISSN
1359-6454

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โœฆ Synopsis


Two Au/Sn couples electrodeposited on metallized Si wafers, a Au/Sn couple (Au deposited first) and a Sn/Au couple (Sn deposited first), were employed to study the room temperature interfacial reactions between Au and Sn. The electroplating sequence has a significant effect on the phases and the microstructures of the reaction regions. AuSn 4 and AuSn are formed in the as-deposited Au/Sn couples, while Au 5 Sn and AuSn are formed in the as-deposited Sn/Au couples. Upon ageing, AuSn 2 formation depends on the Sn (Au) content (i.e. the Sn (Au) layer thickness) in the Au/Sn (Sn/Au) couples. In aged Au/Sn couples, with 1.5 lm of Au and 3 lm of Sn, AuSn, AuSn 2 and AuSn 4 are sequentially distributed in the reaction region with fine Kirkendall voids at the AuSn/Au interface. In the aged Sn/Au couples, with 15 lm of Sn and 1.5 lm of Au, AuSn is distributed on either side of the original Sn/Au interface, while Au 5 Sn only exists on the Au side. The presence of a thin interfacial SnO 2 film significantly affects phase formation and reaction kinetics.


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