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Role of substrate on topography features of nickel deposited nanostructures

✍ Scribed by L. Nzoghe-Mendome; J. Ebothé; A. Aloufy; I.V. Kityk


Book ID
116602592
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
881 KB
Volume
459
Category
Article
ISSN
0925-8388

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In this work, we have studied the influence of the substrate surface condition on the roughness and the structure of the nanostructured DLC films deposited by High Density Plasma Chemical Vapor Deposition. Four methods were used to modify the silicon wafers surface before starting the deposition pro