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Role of local microchemistry and surface structure in electrical resistivity of 50 nm electroless films Ag–W–oxygen

✍ Scribed by E. Glickman; A. Inberg; V. Bogush; G. Aviram; R. Popovitz; N. Croitoru; Y. Shacham-Diamand


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
312 KB
Volume
82
Category
Article
ISSN
0167-9317

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✦ Synopsis


We studied electroless 50 nm films Ag (0.2-1.2 at.% W) which contain also some oxygen and were deposited onto SiO 2 /Si substrate. The films showed better corrosion resistance and hardness than pure Ag, but rather high electrical resistivity q which decayed fast after annealing at T P 100