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Role of Gallium Doping in Dramatically Lowering Amorphous-Oxide Processing Temperatures for Solution-Derived Indium Zinc Oxide Thin-Film Transistors

✍ Scribed by Sunho Jeong; Young-Geun Ha; Jooho Moon; Antonio Facchetti; Tobin J. Marks


Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
300 KB
Volume
22
Category
Article
ISSN
0935-9648

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