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Rippled area formed by surface plasmon polaritons upon femtosecond laser double-pulse irradiation of silicon: the role of carrier generation and relaxation processes

✍ Scribed by Derrien, Thibault J.-Y.; Krüger, Jörg; Itina, Tatiana E.; Höhm, Sandra; Rosenfeld, Arkadi; Bonse, Jörn


Book ID
125344988
Publisher
Springer
Year
2013
Tongue
English
Weight
570 KB
Volume
117
Category
Article
ISSN
1432-0630

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