RF ion source for low energy ion implantation — beam profile control of a large-area ion source using 500-MHz discharge

✍ Scribed by Masayasu Tanjyo; Shigeki Sakai; Masato Takahashi

• Book ID: 108422824
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 329 KB
• Volume: 136
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/s0257-8972(00)01032-x