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RF hydrogen plasma influence on shallow and deep levels in crystalline silicon

✍ Scribed by A. Szekeres; S.S. Simeonov; E. Kafedjiiska

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 228 KB
Volume: 170
Category: Article
ISSN: 0921-4526
DOI: 10.1016/0921-4526(91)90128-2

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