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RF-deposited a-C:H films from hydrogen-rich methane mixtures: relationships among plasma characteristics, deposition rates, and material properties
✍ Scribed by Barbarossa, V.; Galluzzi, F.; Grillo, G.; Mercuri, S.; Tomaciello, R.
- Book ID
- 122363127
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 284 KB
- Volume
- 1
- Category
- Article
- ISSN
- 0925-9635
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