Reverse short-channel effect due to lateral diffusion of point-defect induced by source/drain ion implantation

✍ Scribed by Kunikiyo, T.; Mitsui, K.; Fujinaga, M.; Uchida, T.; Kotani, N.

• Book ID: 111910792
• Publisher: IEEE
• Year: 1994
• Tongue: English
• Weight: 901 KB
• Volume: 13
• Category: Article
• ISSN: 0278-0070
• DOI: 10.1109/43.275360